| 摘要 |
PURPOSE:To allow a surface worked with V grooves to act also as a sputtering blocking layer without generating roughness on the surface and to allow stable production accordingly by exposing metal components which are hardly oxidized and have the sputtering rate lower than the sputtering rate of Ni on the above- mentioned surface. CONSTITUTION:A film 2 contg. at least one among B, C, Al, Si, Ti, V, Cr, Ce, Zr, Nb, Mo, Ru, Hf, Ta, W, Re, Os, and Ir is formed on the master disk for the optical disk previously worked with the V grooves for tracking. At least the surface to be cut with the V grooves is formed of a material 3 essentially consisting of Al. The metal components which are hardly oxidized and have the sputtering rate lower than the sputtering rate of the Ni are exposed on the surface worked with the V grooves and, therefore, the roughening by oxidation does not arise on the surface even if the bases of the bits formed by sputtering are exposed to the atm. air. In addition, said bases can act as the sputtering blocking layer at the time of dry etching. |
