| 摘要 |
PURPOSE:To reduce an initial cost by housing evaporating sources of the same number as the number of layers into one vacuum vapor deposition vessel, preparing the compsns. of the raw materials for vapor deposition to be charged into the respective evaporating sources and the kinds of component elements and evaporating the materials for vapor deposition of the respective evaporating sources by using the same control system. CONSTITUTION:Since the plural evaporating sources 41-42 in the same vacuum vapor deposition vessel 1 are controlled by the same control system, the evaporation of the raw materials to be evaporated charged into the respective evaporating sources 41-42 starts nearly simultaneously. The end of the evaporation is determine by the amt. of the raw materials for vapor deposition to be charged and the construction of the evaporating sources. The lowermost layer mixed with the vapor depositions for vapor deposition from all the evaporating sources is formed before the end of the evaporation from the first one evaporating source and thereafter, the layer mixed with the raw materials to be evaporated from the evaporating sources decreased by one is formed. The layers of the same number as the number of the evaporating sources and the respectively different compsn. are formed in such a manner. The compsn. of the uppermost layer is the same as the compsn. of the material for vapor deposition charged into the evaporating source to end the evaporation in the final. Since the number of the control system to be required is one, the initial cost is reduced. |
