| 摘要 |
PURPOSE:To obtain a synchrotron radiation exposure apparatus suitable for practical use having improved total throughput and high long-term reliability by providing a mirror cleaning mechanism within a vibrating mirror. CONSTITUTION:A mirror cleaning mechanism 8 is arranged in a mirror box 4. An appropriate monitoring system is used for monitoring the surface of a mirror 5 or for measuring an amount of reflected light and when a detected value exceeds a predetermined value the mirror cleaning mechanism 8 is actuated. The mirror cleaning mechanism 8 may be a plasma discharge mechanism, electronic beam radiation mechanism or ion radiation mechanism, wherein generated plasma, electronic beams or ions are applied to the surface of the mirror 5 to clean the same. According to such arrangement, it is possible to obtain a synchrotron radiation exposure apparatus suitable for practical use and having improved total throughput, in which the vibrating mirror 5 is allowed to have long-term reliability by providing countermeasures for preventing deterioration of the mirror surface. |
