发明名称 Conductivity modulated metal oxide semiconductor field effect transistor
摘要 In a conductivity modulated MOS FET which is provided in a separating region between a semiconductor substrate of a conduction type and an epitaxial layer of a different conduction type grown on the semiconductor substrate, a first buried layer of the different conduction type and a second buried layer of the conduction type are on a boundary region between the semiconductor substrate and the epitaxial layer, and a drain region of the conduction type is in the epitaxial layer to be extended from the upper surface thereof to the bottom surface thereof, such that the drain region is in contact with the second buried layer which is separated from the semiconductor substrate. This structure allows the increase of drain current whereby the efficiency of area is improved.
申请公布号 US4901131(A) 申请公布日期 1990.02.13
申请号 US19880246806 申请日期 1988.09.20
申请人 NEC CORPORATION 发明人 TAKAHASHI, KEIJU
分类号 H01L29/68;H01L21/762;H01L29/739;H01L29/78 主分类号 H01L29/68
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