发明名称 Chemical vapor deposition reactor for producing metal carbide or nitride whiskers
摘要 A reactor for producing single crystal metal carbide, nitride, or carbonitride whiskers, where the metal is one or more of Ti, Zr, Hf, Nb, Ta or W. The reactor walls and inner fixtures provide the substrate surfaces, greatly increasing the surface area available for whisker growth. Preferred substrate materials are nickel or high nickel alloy coated with TiC or TiN, or, for carbide or carbonitride whiskers, nickel impregnated graphite. An alternate embodiment provides a collecting chamber and vibrating means to mechanically detach whiskers, allowing for more efficient batch, or continuous operation.
申请公布号 US4900525(A) 申请公布日期 1990.02.13
申请号 US19860899834 申请日期 1986.08.25
申请人 GTE LABORATORIES INCORPORATED 发明人 D'ANGELO, CHARLES;BALDONI, II, JOSEPH G.;BULJAN, SERGEJ-TOMISLAV
分类号 C30B25/00 主分类号 C30B25/00
代理机构 代理人
主权项
地址