| 摘要 |
PURPOSE:To offset a fine deviation and to obtain a uniform image by a method wherein a reticle is manufactured in such a way that the number of unit photodetectors constituting a repeat unit cell of the reticle in one reticle process is changed from that in another reticle process. CONSTITUTION:A size of unit photodetectors 1 is identical in a process to form a channel stop and in a process to form an N-well; in the process to form the channel stop, the unit photodetectors 1 are gathered in six rows in one line as a repeat unit cell 3 of a reticle; the reticle is formed as the repeat unit cell. On the other hand, in the process to form the N-well, the unit photodetectors 1 are gathered in six rows in tow lines as a repeat unit cell 4; a reticle is formed at the repeat unit cell. In this manner, a shape of the repeat unit cell is changed in a halfway stage of a reticle formation process. Thereby, a fine deviation is offset; a uniform image can be obtained. |
