发明名称 Method for circuit repair on integrated circuits and substrates.
摘要 <p>The invention relates to accessing and repairing electrical opens in conducting metal lines on a semiconductor chip or other substrate using laser plating techniques. A maskless means of repairing discontinuities in a conductor disposed on the surface of a substrate is provided wherein the surface is locally irradiated to form a reversible carbonaceous layer thereon. This reversible carbonaceous layer acts as a base for electrodeless deposition of a metal to form a bridge across the discontinuity by laser-enhanced exchange plating or other suitable methods. Further addressed is, a means of accessing and repairing a discontinuity buried by a cover layer of an insulating or passivating material, wherein access to the discontinuity is provided by ablating away the cover layer using a pulsed excimer laser at a first power level.</p>
申请公布号 EP0353463(A2) 申请公布日期 1990.02.07
申请号 EP19890111925 申请日期 1989.06.30
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DONELON, JOHN JOSEPH;DOYLE, JAMES PATRICK;HURST, JERRY ELDEN, JR.;OPRYSKO, MODEST MICHAEL;ROSSNAGEL, STEPHAN MARK;VON GUTFELD, ROBERT JACOB
分类号 H05K3/46;H01L21/48;H01L21/768;H05K3/10;H05K3/18;H05K3/22 主分类号 H05K3/46
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