Method for circuit repair on integrated circuits and substrates.
摘要
<p>The invention relates to accessing and repairing electrical opens in conducting metal lines on a semiconductor chip or other substrate using laser plating techniques. A maskless means of repairing discontinuities in a conductor disposed on the surface of a substrate is provided wherein the surface is locally irradiated to form a reversible carbonaceous layer thereon. This reversible carbonaceous layer acts as a base for electrodeless deposition of a metal to form a bridge across the discontinuity by laser-enhanced exchange plating or other suitable methods. Further addressed is, a means of accessing and repairing a discontinuity buried by a cover layer of an insulating or passivating material, wherein access to the discontinuity is provided by ablating away the cover layer using a pulsed excimer laser at a first power level.</p>
申请公布号
EP0353463(A2)
申请公布日期
1990.02.07
申请号
EP19890111925
申请日期
1989.06.30
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
DONELON, JOHN JOSEPH;DOYLE, JAMES PATRICK;HURST, JERRY ELDEN, JR.;OPRYSKO, MODEST MICHAEL;ROSSNAGEL, STEPHAN MARK;VON GUTFELD, ROBERT JACOB