发明名称 Developer composition for solvent-developable photoresist coatings.
摘要 <p>The present specification describes an aqueous developer composition which can develop solvent developable photosensitive materials and comprises a surfactant, a terpene and water, in defined proportions. In a preferred form, the composition includes about 0.5-10% by wt. of a surfactant, and about 0.2-10% by wt. of a terpene, the rest being water. Most preferably, the composition comprises about 3-6% by wt. of a surfactant, and about 4-8% by wt. of a terpene, the rest being water. The surfactant is preferably a non-ionic surfactant or mixture thereof, and the terpene is d-limonene. A concentrate formulation also is provided herein from which the aqueous developer composition may be made by dilution with water, usually in an amount of about five to ten times of the concentrate.</p>
申请公布号 EP0353878(A1) 申请公布日期 1990.02.07
申请号 EP19890306971 申请日期 1989.07.10
申请人 M & T CHEMICALS, INC. 发明人 HUNG, PAUL L. K.;TSENG, KENNETH K.S.
分类号 G03F7/32;H05K3/28 主分类号 G03F7/32
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