发明名称 Method of manufacturing a high-yield solder bumped semiconductor wafer
摘要 Disclosed is a method of manufacturing a high-yield solder bumped semiconductor wafer. The method comprises providing a non-solderable transfer substrate having a transfer surface for receipt of solder material; depositing solder material onto the transfer surface to form solder bumps in a predetermined pattern; aligning solderable conductive elements of a semiconductor wafer with the predetermined solder bumps on the transfer surface; and reflowing the patterned solder bumps into wetted contact with the wafer conductive elements.
申请公布号 US4898320(A) 申请公布日期 1990.02.06
申请号 US19880274207 申请日期 1988.11.21
申请人 HONEYWELL, INC. 发明人 DUNAWAY, THOMAS J.;SPIELBERGER, RICHARD K.;DICKS, LORI A.
分类号 B23K1/20;H01L21/50;H01L21/60;H01L23/498;H05K3/34 主分类号 B23K1/20
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