发明名称 |
Method of manufacturing a high-yield solder bumped semiconductor wafer |
摘要 |
Disclosed is a method of manufacturing a high-yield solder bumped semiconductor wafer. The method comprises providing a non-solderable transfer substrate having a transfer surface for receipt of solder material; depositing solder material onto the transfer surface to form solder bumps in a predetermined pattern; aligning solderable conductive elements of a semiconductor wafer with the predetermined solder bumps on the transfer surface; and reflowing the patterned solder bumps into wetted contact with the wafer conductive elements.
|
申请公布号 |
US4898320(A) |
申请公布日期 |
1990.02.06 |
申请号 |
US19880274207 |
申请日期 |
1988.11.21 |
申请人 |
HONEYWELL, INC. |
发明人 |
DUNAWAY, THOMAS J.;SPIELBERGER, RICHARD K.;DICKS, LORI A. |
分类号 |
B23K1/20;H01L21/50;H01L21/60;H01L23/498;H05K3/34 |
主分类号 |
B23K1/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|