| 摘要 |
<p>A hologram recording assembly (10) includes a transparent, absorbent member (12) supported on a substrate (14). The transparent member (12) is positioned to be directly incident to an exposure beam (A1, A2). The transparent member (12) is out of moisture equilibrium during an exposure time. Consequently, the transparent member (12) increases or decreases in thickness (S) depending on a moisture difference between it and the environment (28). As the thickness (S) changes, a phase shift (A1 DEG , A2 DEG ) in the light reflections within the recording assembly (10) blurs spurious holograms while leaving the desired hologram intact.</p> |
