| 摘要 |
PURPOSE:To obtain a head excellent in the wear resistance with a large hardness and better in the crack resistance with a chemical stability by arranging an SiO2 layer, SiOxNy layer and an SiN1.33 layer for three layers of wear resistance provided on a heat generating body layer of a thermal recording head sequentially from the bottom thereof. CONSTITUTION:A heat generating resistor layer 2 and an Al electrode 3 made of Cr-Si-O alloy are provided on an alumina substrate 1 with a glazed layer. First, SiH4 and N2O gases as reacting gas and N2 gas as carrier gas are introduced thereinto to form an SiO2 film by plasma CVD method. Then, after additional introduction of NH4 gas, the quantity of the N2O gas is reduced gradually to form a film of SiOxNy (0<x<2.0<y<1.33) continuously. Then, the introduction of the N2O gas is stopped and a film of SiN1.33 is formed continuously. The thickness of the SiOxNy layer is preferably 0.5-5mum. |
