发明名称 PURIFICATION OF RAW MATERIAL FOR SILICA GLASS
摘要 PURPOSE:To obtain the title high-purity raw material by calcination and grinding, acid treatment and heating treatment in a conditioning atmosphere, of a natural siliceous powder material in a specific mode, successively in this order to remove esp. radioactive elements or alkali elements. CONSTITUTION:The objective purification of natural siliceous powder material by heating in a conditioning atmosphere along with acid treatment is carried out as follows: firstly, said siliceous material is heated at 500-700 deg.C followed by cooling to obtain a calcined product, which is then ground into 60-200 mesh granules. Second, the granules are heated at 1,000-1,200 deg.C in a halogen or its compound-contg. conditioning atmosphere. Such processes as grinding, dipping and heat treatment are performed successively in this order. In this purification method, high-temperature heating is finally made in a halogen-contg. atmosphere; therefore even impurities present in the calcined product which could not be removed even through the prior dipping treatment will highly efficiently, economically be removed.
申请公布号 JPH0230628(A) 申请公布日期 1990.02.01
申请号 JP19880178245 申请日期 1988.07.19
申请人 JAPAN METALS & CHEM CO LTD 发明人 NISHIDA JUN;NAKAMURA MASARU;SHIMADA AKIRA;HANAO KIYOYOSHI;KATAFUCHI KIYOSHI
分类号 C03B8/00;C03C1/02 主分类号 C03B8/00
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