发明名称 METHOD FOR ESTIMATING POSITIONAL RESOLVING POWER OF ELECTRON BEAM MICROANALYZER
摘要 PURPOSE:To enhance measuring efficiency by setting the optimum scanning density on the surface of each sample by estimating the expanse of the generation region of characteristic X-rays by calculation and preliminarily grasping the theoretical positional resolving power of actual measured data. CONSTITUTION:When an accelerated electron enter a sample, the electron repeats collisions and repulsions with the atoms constituting the sample and advances while drawing an irregular trace. In this process, the position where the electron collides with the atom of the certain element in the sample to discharge characteristic X-rays is three-dimensionally calculated by Monte Carlo simulation, and the simulation is performed many times to calculate the distribution state of the radiation position of characteristic X-rays to project the same on the surface of the sample. Said distribution state is displayed as the expanse of the radiation range of characteristic X-rays on the surface of the specimen and, when the expected positional resolving power of the sample to be measured is calculated, a range analized by the irradiation with electron beam at one point is cleared. This analytical range is actually at least one pixel region and the practical max. positional resolving power in mapping measurement.
申请公布号 JPH0231146(A) 申请公布日期 1990.02.01
申请号 JP19880180075 申请日期 1988.07.19
申请人 SHIMADZU CORP 发明人 KOMI HIDETO;TAKEUCHI YUKA
分类号 G01N23/225 主分类号 G01N23/225
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