APERIODIC MONOLITHIC CERAMIC FILTER AND ITS MANUFACTURE

摘要

PURPOSE: To make the etching and the polishing of a gild layer be unnecessary by utilizing an artwork process previously designed to execute plating on the upper surface of a filter. CONSTITUTION: The 1/4 wavelength frequency of the block 210 formed of dielectric material is measured, and then the plating artwork mask 310 process is designed according to the characteristic concerning with a prescribed selected frequency. The artwork mask 310 is used to shift the characteristic relevant to the prescribed selected frequency into the desired prescribed frequency characteristic and selectively apply the dielectric material 240 to the surface of the block 210. Thus, any etching or polishing on the gild 240 on the block 210 are unnecessary.