METHOD OF SURFACE TREATMENT OF SILICON SUBSTRATE,申请号JP19880176329-传众专利搜索

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发明名称	METHOD OF SURFACE TREATMENT OF SILICON SUBSTRATE
摘要
申请公布号	JPH0226027(A)	申请公布日期	1990.01.29
申请号	JP19880176329	申请日期	1988.07.15
申请人	KYUSHU ELECTRON METAL CO LTD;OSAKA TITANIUM CO LTD	发明人	OSHIMA FUMIHIRO;KIKUTAKE TOSHITOMO
分类号	H01L21/302;H01L21/304	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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