| 摘要 |
A gas supply pipeline system for process equipment, adapted to supply at least two kinds of process gas, and provided with at least two valves (135, 136, 139, 140) installed in each of independent flow passages formed between process gas supply pipelines and a purge gas supply pipe line, and at least two valves (137, 138, 141, 142) installed in each of a plurality of flow passages formed between the process gas supply pipelines and the pipelines in the process equipment. Each of the process gas supply pipelines and each of the pipelines in the process equipment can be purged and vacuumed by at least two valves in each of these flow passages that are opened or closed independently, and the stagnation of a gas in the pipelines not in use can be prevented by introducing a purge gas constantly thereinto. |
