| 发明名称 |
STRIPPING COMPOSITION USING N-CYCLOHEXYL-2-PYRROLIDONE |
| 摘要 |
A stripping composition for removing resist materials or other polymeric layers from a substrate contains N-cyclohexyl-2-pyrrolidone. Either or both of an organic solvent and an alkaline amine compound may be added to the stripping composition. |
| 申请公布号 |
WO9000579(A1) |
申请公布日期 |
1990.01.25 |
| 申请号 |
WO1989US03037 |
申请日期 |
1989.07.12 |
| 申请人 |
ADVANCED CHEMICAL SYSTEMS INTERNATIONAL CORPORATIO |
发明人 |
BOWDEN, WILLIAM, C.;BREWER, RICHARD, L. |
| 分类号 |
C09D9/00;G03F7/42;(IPC1-7):C09D9/00;C11D7/50 |
主分类号 |
C09D9/00 |
| 代理机构 |
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代理人 |
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