发明名称 PRETREATMENT FOR ELECTROLESS PLATING
摘要 PURPOSE:To form a Cu film having superior uniformity by electroless plating with superior depositability by pretreating the part of a resin board requiring plating with a specified silicone surfactant when the part is electroless-plated with Cu to produce a printed circuit board. CONSTITUTION:When the part of a board of an electrically nonconductive material such as resin requiring plating is electroless-plated with Cu to produce a printed circuit board, the part is pretreated by contact with a silicone surfactant having a pendently added polyether group represented by formula I (where each of R and R' is alkyl or H and m+n+x=3,000-4,000) as a side chain. By this pretreatment, a catalyst for electroless Cu plating is effectively adsorbed, bubbles in the through holes and blowholes in the board are rapidly removed and the occurrence of plating voids is prevented.
申请公布号 JPH0222477(A) 申请公布日期 1990.01.25
申请号 JP19880171426 申请日期 1988.07.08
申请人 HITACHI CHEM CO LTD 发明人 TAKITA TAKAO;SHIMAZAKI TAKESHI;AKAZAWA SATOSHI
分类号 C23C18/20;H05K3/18;H05K3/38 主分类号 C23C18/20
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