发明名称 CONTROLLING DEVICE FOR ETCHING STAGE
摘要 PURPOSE:To stabilize an etching stage and also to prolong the service life of etchant by comparing both the stage of etchant which changes with the lapse of time in the corroding stage of an IC lead, etc., and the carrier velocity of the IC lead in the etchant with information stored in a memory device, deciding and controlling the state and the carrier velocity. CONSTITUTION:FeCl3 liquid of etchant contained in a tank 14 is fed to an etcher 12 in which an IC, etc., are etched and worked by FeCl3. The etching conditions such as the temp. of etchant in the etcher 12, electromotive force, Baume degree, pH value and IC carrier velocity are sent time sequentially to a decision processing device 22 via an input interface 20 from an input terminal 18 and stored in a main memory device 24 and an external memory device 26. The necessary conditions of etchant are inputted to the device 22 from an input device 32. A signal is output from the device 22 and thereby a regulation liquid feeder 16 is actuated via an output interface 28 and the proper quantity of HCl or H2O is fed into the etchant tank 14 and etchant of proper concn. is fed to the etcher 12 or the velocity of a conveyer for an IC to be treated is controlled. Thereby etching reaction is stably performed and also the service life of etchant is prolonged.
申请公布号 JPH0222483(A) 申请公布日期 1990.01.25
申请号 JP19880170699 申请日期 1988.07.08
申请人 TOPPAN PRINTING CO LTD 发明人 NAKAJI YORIO
分类号 C23F1/08;C23F1/00;H01J9/14;H01L21/306;H01L21/3213 主分类号 C23F1/08
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