| 摘要 |
<p>A mask inspection device (20) for inspecting features above a given size on an image defining mask (14) used in a semiconductor fabrication imaging system (10), the mask inspection device (20) being a substrate having an array (44) of energy responsice devices (46) thereon; an array (52) of energy transmissive openings (54), each of which openings (54) corresponds to and is aligned with one of the energy responsive devices (46) and has a size related to the given size, the array (52) of openings (54) being positioned remote from the energy responsive devices (46) such that any energy applied through a said opening (54) is applied to the energy responsive device (46) corresponding to that opening (54); and means (26,28,30,32) for providing data manifesting the changed condition of the energy responsive devices (46) to comparing means (34) for a determination of the mask (14) features. A comparison can be made against data previously obtained from a known good mask and a determination can be made whether the mask under test is acceptable or flawed.</p> |
