发明名称 Metal material with film passivated by fluorination and apparatus composed of the metal material.
摘要 <p>A metal material characterised in that a film passivated by fluorination which is mainly composed of a metal fluoride substantially satisfying stoichiometric ratio is formed at least partially on a surface of a metal of the metal material, and an apparatus at least partially composed of the metal material.</p>
申请公布号 EP0352061(A2) 申请公布日期 1990.01.24
申请号 EP19890307252 申请日期 1989.07.18
申请人 HASHIMOTO CHEMICAL INDUSTRIES CO., LTD. 发明人 TADAHIRO, OHMI;MASAHIRO, MIKI;MATAGORO, MAENO;HIROHISA, KIKUYAMA
分类号 C23C8/08;H01S3/225 主分类号 C23C8/08
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