| 发明名称 |
APPARATUS FOR WASHING AND DRYING SUBSTRATES |
| 摘要 |
For washing and drying substrate, the substrate retained by a carrier is immersed in a washing liquid. And then the substrate is withdrawn upwardly from the washing liquid while being vibrated. Through the withdrawal, a drying gas is applied onto the substrate, resulting in removing the washing liquid from the surface of the substrate.
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| 申请公布号 |
KR900000174(B1) |
申请公布日期 |
1990.01.23 |
| 申请号 |
KR19850002512 |
申请日期 |
1985.04.15 |
| 申请人 |
SHARP KK;DAINICHI SHOJI KK |
发明人 |
KISHIDA YOSHIFUNI;TAKEUCHI MASAYOSHI |
| 分类号 |
H01L21/304;B08B3/04;H01L21/00;(IPC1-7):H01L27/00 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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