发明名称 |
High-efficiency, multilevel, diffractive optical elements |
摘要 |
The method utilizes high resolution lithography, mask aligning, and reactive ion etching. In particular, at least two binary amplitude masks are generated. A photoresist layer on an optical element substrate is exposed through the first mask and then etched. The process is then repeated for the second and subsequent masks to create a multistep configuration. The resulting optical element is highly efficient.
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申请公布号 |
US4895790(A) |
申请公布日期 |
1990.01.23 |
申请号 |
US19870099307 |
申请日期 |
1987.09.21 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
SWANSON, GARY J.;VELDKAMP, WILFRID B. |
分类号 |
G02B3/08;G02B5/18;G02B27/44;G03F1/14;G03F7/00;G03F7/20 |
主分类号 |
G02B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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