| 摘要 |
PURPOSE:To prove the quality of a cured film in response to various types of semiconductor wafers by providing an ultraviolet ray radiation dosimeter for detecting the quantity of an ultraviolet ray of a mercury lamp near the wafer of a resist curing device for curing a resist coating the wafer. CONSTITUTION:A radiation intensity command is sent from a calculation controller 3 to a frequency/voltage varying unit 6 according to a process of the type of a semiconductor associated in advance, and the frequency/voltage according to this command is applied to a mercury lamp 2. If the value of an ultraviolet ray radiation dosimeter 9 which detects the illuminance of the lamp 2 becomes different from a reference value, the controller 3 judges the necessity of correction. If it is necessary, a correction command is set to the unit 6, and corrected voltage and frequency are applied to the lamp 2. Accordingly, even if the illuminance of the lamp is reduced due to the irregularity of the lamp and the lapse of a firing time, the ultraviolet ray having the illuminance and the time responsive to the process of the type is always applied onto a semiconductor wafer 1. |
