Verfahren zur Herstellung einer halbleitenden Mangandioxydschicht und einer Siliciumdioxyd enthaltenden Schicht auf einem gesinterten Tantalkoerper fuer einen Elektrolytkondensator,申请号DE196200S2664-传众专利搜索

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发明名称	Verfahren zur Herstellung einer halbleitenden Mangandioxydschicht und einer Siliciumdioxyd enthaltenden Schicht auf einem gesinterten Tantalkoerper fuer einen Elektrolytkondensator
摘要
申请公布号	DE1184016(B)	申请公布日期	1964.12.23
申请号	DE196200S2664	申请日期	1962.11.30
申请人	SPRAGUE ELECTRIC COMPANY	发明人	KOMISAREK, JOSEPH, A.
分类号	H01G;H01G9/00;(IPC1-7):H01G	主分类号	H01G
代理机构		代理人
主权项
地址

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