| 摘要 |
PURPOSE:To enable easy preparation of a negative lith-type film by a conventional thermal transfer printer on the market, by providing a light-transmitting thermoplastic exfoliation layer in a lower layer part on a transparent base sheet and by providing a thermoplastic light-intercepting layer in an upper layer part thereon. CONSTITUTION:A lith-type film material has a light-transmitting thermoplastic exfoliation layer in a lower layer part on a transparent base sheet and has a thermoplastic light-intercepting layer in an upper layer part thereon. The melting point of the exfoliation layer is 55 to 140 deg.C and the viscosity of the exfoliation layer at the time when it is melted by heat needs to be 2000 CPS or below at a temperature of the melting point +30 deg.C. Moreover, the thermoplastic light-intercepting layer needs to contain, in its composition, 5 to 90 parts by weight single or two or more kinds of thermoplastic resin, the softening point of which is 50 to 165 deg.C. The thickness of the light-intercepting layer is in the range of 0.5 to 10mum. The main constituents of the thermoplastic exfoliation layer are solid wax and thermoplastic resin. |
