发明名称 FORMING METHOD OF MASK FOR X-RAY LITHOGRAPHY
摘要 PURPOSE:To easily and quickly separate a flat plate from a mask film body when the mask film body formed on the flat plate is transferred to a holder, by providing a metal layer between the mask film body and the flat plate. CONSTITUTION:After a mask film body 6 composed of X-ray transmitting layers 3, 5 and an X-ray absorber 4 is formed on a flat plate 1, the mask film body 6 is fixed on a retaining body 7, the flat plate 1 is separated from the mask body 6, and the mask film body 6 is transferred to the retaining body 7 to form a mask for X-ray lithography. At this time, a metal layer 2 is arranged between the mask film body 6 and the flat plate 1, thereby facilitating the separation of the mask body 6 and the flat plate 1. For example, the above metal layer 2 contains one or more kinds of gold, silver, tin, platinum, palladium and rhodium, and is formed by using vacuum heating deposition method, sputtering method, etc. After the metal layer 2 is dipped in solvent, and the flat plate 1 and the metal layer 2 are separated, the metal layer 2 is eliminated by a method such as dissolving elimination and plasma etching.
申请公布号 JPH0212808(A) 申请公布日期 1990.01.17
申请号 JP19880160713 申请日期 1988.06.30
申请人 CANON INC 发明人 IKEDA TSUTOMU;SUGATA MASAO;KATO HIDEO
分类号 G03F1/68;G03F1/80;H01L21/027;H01L21/30 主分类号 G03F1/68
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