| 摘要 |
PURPOSE:To enable forming a pattern having a high aspect ratio, and to improve the production yield of the title material by incorporating a compd. capable of generating an acid by light and a water-soluble resin in the pattern forming material. CONSTITUTION:The pattern forming material is composed of the compd. (A) capable of generating the acid by the light and the water-soluble resin (B). The component (A) is preferably composed of an onium salt compd. (for example, a compd. shown by formula). The component (B) is preferably composed of polyvinyl pyrrolidone, etc. The pattern of the pattern forming material which does not generate wear of the film, is formed by applying pure aqueous solutions of the components (A) and (B) on a substrate, respectively, and then exposing the obtd. substrate through a mask with (g) line rays, etc., and developing the exposed substrate. |
