| 摘要 |
PURPOSE:To obtain a pattern having a high aspect ratio, without generating a faulty pattern shape, and to improve the production yield of the title material by incorporating a specified photosensitive material in the pattern forming material. CONSTITUTION:The pattern forming material contains a 1,2-naphtoquinone diazide ester (A) of trihydroxy benzophenone and a styrene resin (B). The component (A) is preferably composed of a 1,2-naphtoquinone diazide-4-ester or a 1,2-naphtoquinone diazide-5-ester (for example, a compd. shown by formula I). The component (B) is preferably composed of polyvinyl phenol, poly(bromophenol) or a copolymer of styrene-maleic acid ester (such as a compd. shown by formula II) or a mixture thereof. |
