发明名称 ACTIVE MATRIX SUBSTRATE AND PRODUCTION THEREOF AND LIQUID CRYSTAL DISPLAY ELEMENT FORMED BY USING THE SAME SUBSTRATE
摘要 <p>PURPOSE:To improve the production yield of an AMX substrate by adopting the constitution consisting in constituting scanning lines of >=2 layers of metallic films and anodizing the entire surface of the metallic film on the uppermost layer to provide an oxide layer thereon. CONSTITUTION:The active matrix substrate and the liquid crystal display element formed by using the substrate are formed of the auxiliary scanning lines 2 provided on a substrate 1 having the surface formed of an insulator such as glass, the main scanning lines 3 provided thereon, the oxide film 11 formed by anodizing of the scanning lines 13, a gate insulating film 4 provided thereon, a semiconductor layer 5, and signal lines 6. Since the scanning lines of the intersected parts of the scanning lines-signal lines have the multilayered structure of the main scanning lines 3 and the auxiliary scanning lines 2, the redundancy increases and the disconnection decreases. Since the oxide films 11 are provided over the entire surface of the main scanning line by the anodic oxidation, the insulation is attained by the two layers; the oxide film 11 and the gate insulating layer 4 even if misregistration arises; therefore, short circuiting is prevented.</p>
申请公布号 JPH0210330(A) 申请公布日期 1990.01.16
申请号 JP19880159100 申请日期 1988.06.29
申请人 HITACHI LTD 发明人 KOSHIMO TOSHIYUKI;MATSUZAKI EIJI;YORITOMI YOSHIFUMI;KENMOCHI AKIHIRO;TAKANO TAKAO;NAKATANI MITSUO
分类号 G02F1/136;G02F1/1362;G02F1/1368;G09F9/30;H01L27/12;H01L29/78;H01L29/786 主分类号 G02F1/136
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