| 摘要 |
PURPOSE:To improve the production yield of the title material, without generating a faulty pattern caused by the exposure of excimer laser beams, etc., by incorporating a specified compd. in the material. CONSTITUTION:The pattern forming material is composed of a 1,2-quinone diazide sulfonyl chloride compd. (A) and an alkali-soluble resin (B). The component (A) is preferably composed of 1,2-naphtoquinone diazide-4-sulfonyl chloride, etc. The 1,2-quinone diazide compd. such as 1,2-naphtoquinone diazide, etc., is preferably used instead of the component (A). A novolak resin, etc., is preferably used for the component (B), and, the pattern forming material comprises preferably a compd. contg. a group shown by formula I (such as a compd. shown by formula II). |
