| 摘要 |
<p>PURPOSE:To enable solid, gaseous and liquid impurities to be removed simultaneously and to contrive a miniaturization of a filter for removing impurities by arranging an oxidation agent, a reduction agent or an adsorbent on a surface or inside a filter. CONSTITUTION:A filter 8, which has a construction equipped with adsorbent, is formed by sticking a adsorbent layer 7 composed of molecular sieve, etc., to a gas supply side of a filter 8 for removing foreign matters. This filter is installed and used, e.g., in a supply system of clean gas for semiconductor production. Solid and gaseous impurities such as dust, moisture, carbon, contained in a gas such as nitrogen supplied from a cylinder are removed simultaneously by passing through the filter 8.</p> |
