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发明名称
Verfahren zur Herstellung von Halbleiterbauelementen, bei dem homogene Metallschichten auf Halbleiterkristalle aufgebracht werden
摘要
申请公布号
CH400717(A)
申请公布日期
1965.10.15
申请号
CH19610002037
申请日期
1961.02.21
申请人
SIEMENS & HALSKE AKTIENGESELLSCHAFT
发明人
DR. HENNING,WOLFGANG,DIPL.-PHYS.;DORENDORF,HEINZ,DR.
分类号
C23C14/14;C23C14/58;C23C26/00;C30B31/02;H01L21/00;H01L23/482;(IPC1-7):C23C19/00
主分类号
C23C14/14
代理机构
代理人
主权项
地址
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