| 摘要 |
PURPOSE:To decrease stress to an X-ray transmission film of an X-ray absorber and make the surface of the X-ray absorber smooth in an X-ray mask having an X-ray absorber by forming an X-ray absorber from an alloy formed by adding at least one kind of Al, Ti, Si and Mo to Ta. CONSTITUTION:An X-ray absorber 4a, the film thickness of which is, for example, 0.5 to 1.0mum is formed on an X-ray transmission film 3 by sputtering. Concretely, Ta-Al alloy target in which 1wt.% of Al is added to Ta is made, then can be sputter-formed at a discharge power of, e.g., 300W and a gas pressure of, e.g., 25 to 30mTorr. The X-ray absorber 4a should be an alloy in which at least one kind from Al, Ti, Si and Mo is added to Ta. Further, it may be composed of a nitride of alloys formed by adding N2 gas. In addition to the addition of the N2 gas. oxygen may be added. As a result, the stress to the X-ray transmission film 3 of the X-ray absorber 4a can be controlled low easily and the surface of the absorber 4a can be made smooth. |
