| 摘要 |
PURPOSE:To assure the exact detection of the timing for repacking a compd. and deposition processing with stable quality by controlling a heater for heating the compd. in a reservoir in accordance with the pressure detected by a vacuum sensor thereby regulating the flow rate of a deposition gas. CONSTITUTION:An ion optical system 2 which focuses and scans the ions from an ion source 1, a secondary charge particle detector 5 which controls the ion source 1 by detecting the secondary electrons generated by a sample 3 at the time of scanning by a focusing ion beam 17, and a nozzle 7 which supplies the deposition gas generated by heating the compd. 11 of the reservoir 9 by a heater 10, etc., are provided a vacuum chamber 18. The pressure corresponding to the flow rate of this deposition gas is detected by the vacuum sensor 18 and the output of the heater 20 is calculated by an arithmetic unit 19. The heater 10 is controlled via a heater power source 20. The flow rate of the deposition gas is regulated in this way and the deposition processing with the stable quality is executed even if the residual amt. of the compd. decreases. The timing for repacking of the compd. is exactly detected. |
