| 摘要 |
PURPOSE:To simplify the alignment of an orifice plate by providing an aligning pattern to the orifice plate. CONSTITUTION:A dry film being a photosensitive resin film is laminated to a base plate 2 and, by a photolithographic etching process, not only the shape and orifices of an orifice plate are formed but also a pattern 9 for aligning the orifice plate is formed simultaneously. Next, plating 5 is applied to the base plate in a thickness equal to or less than that of the dry film 4 and, when the base plate and the plating applied thereto are released, the released plating has the same shape as a patterning shape and becomes the orifice plate. The orifice plate is arranged to the base plate and the flow passages thereof to align the orifice at the center of the orifice plate 3 with the flow passage at the center of the base plate and a flow passage formed member or orifice plate 3 is rotated around the orifice. At this time, the orifice plate can be adjusted while the patterns of both ends are confirmed, because a pattern 9 for the alignment is formed to said plate. |
