| 摘要 |
PURPOSE:To prevent undesired generation of shortcircuits between photoelectric conversion elements and to thereby improve the durability of a mask by forming a mask pattern in which island regions are surrounded by overlapping a plurality of masks, and by laminating a first electrode layer, an optically activated layer, and a second electrode layer using this mask. CONSTITUTION:When an island region 1a is divided and two masks 10, 11 are overlapped with each other, a desired island region 1a is covered. Mask patterns 12, 13 are formed so as to have a partial overlapping. An electrode layer 2 is formed by using the mask 10 by which the mask pattern 12 is formed. Successively, another electrode layer 2 is formed by using the mask 11 by which the mask pattern 13 is formed. Respective activated layers and a second electrode layer 4 are likewise formed. Accordingly, it is ensured to prevent undesired generation of shortcircuits between the photoelectric transfer elements, and it is possible to improve the durability of the mask. |
