| 摘要 |
PURPOSE:To obtain high-accuracy and dense light shieldable insulating films by selectively curing a curable resin by exposing of a transparent substrate from the rear surface thereof with light shieldable inorg. film patterns as a mask, removing the uncured part of the curable resin, forming the light shieldable insulating film and stripping the light shieldable inorg. film patterns on transparent conductive patterns. CONSTITUTION:After the pigment-contg. photosetting resin coated film 4 is precured, said film is irradiated with UV rays 5 from the rear surface of the substrate 1. Since the light shieldable inorg. film patterns 3a exist on the transparent conductive patterns 2a, the parts of the photosetting resin coated film 4 thereon are not exposed and remain uncured so that only the parts of the coated film 4 in the spacings between the patterns 2a are sharply exposed. The entire part of the substrate after the exposing is subjected to a cleansing treatment (baking) and the light shieldable insulating film 4a is formed thereon. The entire part of the substrate is then immersed in concd. nitric acid to strip the patterns 3a and thereafter, the substrate is cleaned. The light shieldable inorg. film films 4a having good accuracy are formed in the spacings between the patterns 2a on the substrate 1 in this way. |
