发明名称 Purification process for hydrogen peroxide
摘要 To reduce the impurities by a factor of from 100 to 1000, in a purification process for hydrogen peroxide the metal ions present in the hydrogen peroxide solution are first converted into anionic complexes using polydentate ligands and the hydrogen peroxide solution is then treated with anion exchangers. The process is used in semiconductor technology, in particular in the production of highly integrated data storage circuits (memory circuits).
申请公布号 DE3822348(A1) 申请公布日期 1990.01.04
申请号 DE19883822348 申请日期 1988.07.01
申请人 SIEMENS AG, 1000 BERLIN UND 8000 MUENCHEN, DE 发明人 SCHAEFER, HELWIG, DIPL.-CHEM. DR., 8000 MUENCHEN, DE;RIEGER, WALTER, DIPL.-CHEM. DR., 8411 LAABER, DE;LECHNER, ALFRED, DIPL.-CHEM. DR., 8400 REGENSBURG, DE;PAMMER, ERICH, DIPL.-CHEM. DR., 8028 TAUFKIRCHEN, DE;BENSCH, WOLFGANG, DIPL.-CHEM. DR., 8000 MUENCHEN, DE
分类号 C01B15/013 主分类号 C01B15/013
代理机构 代理人
主权项
地址