发明名称 Semiconductor devices.
摘要 <p>In a semiconductor device (54) having trench-shaped element isolating regions (37) formed in a semiconductor body (21) and also a conductive layer (42) extending on each element isolating region (37) and connected to an impurity diffusion region (46) of the semiconductor body (21) there is formed an insulator layer region (34) between an extension of the conductive layer (42) and the element isolating region (37), and the insulator layer region (34) is buried in the surface portion of the semiconductor body (21).</p>
申请公布号 EP0349107(A2) 申请公布日期 1990.01.03
申请号 EP19890304626 申请日期 1989.05.08
申请人 SONY CORPORATION 发明人 HOZUMI, HIROKI C/O PATENT DIVISION;NAKAMURA, MINORU C/O PATENT DIVISION;MIWA, HIROYUKI C/O PATENT DIVISION;KAYANUMA, AKIO C/O PATENT DIVISION
分类号 H01L29/73;H01L21/331;H01L21/763;H01L23/485;H01L29/732 主分类号 H01L29/73
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