发明名称 |
Method and apparatus for plasma treatment |
摘要 |
A mirror field which faces a surface of a specimen to be treated and which has its field axis parallel to the specimen surface is formed in an atmosphere in a reactive gas, and a plasma of the reactive gas is then generated by introducing microwave energy into a region where the mirror field is formed, the thus-formed plasma being confined by the mirror field. The specimen is then treated by activated neutral particles which are produced by the plasma to the surface of the specimen. Preferably, an electric field is formed in the direction along the field axis of the mirror field in a region where the plasma is generated.
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申请公布号 |
US4891095(A) |
申请公布日期 |
1990.01.02 |
申请号 |
US19890325917 |
申请日期 |
1989.03.20 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
ISHIDA, TOMOAKI;NISHIOKA, KYUSAKU |
分类号 |
H01L21/302;H01J37/32;H01L21/205;H01L21/3065;H01L21/31;H05H1/46 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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