发明名称 Processes for the manufacture of laser including monolithically integrated planar devices
摘要 Monolithically integrated devices are disclosed in which a laser having a capping layer with a relatively high conductivity imparting ion concentration is laterally offset along a planar surface from a surface layer having a lower conductivity imparting ion concentration. The monolithically integrated laser and surface layer are formed by providing laterally offset channels in a planar substrate surface and selectively epitaxially growing the required laser layers and the surface layer in separate channels.
申请公布号 US4891093(A) 申请公布日期 1990.01.02
申请号 US19860908743 申请日期 1986.09.18
申请人 EASTMAN KODAK COMPANY 发明人 SMITH, FRANK T. J.
分类号 H01L27/15;H01S5/00;H01S5/02;H01S5/026;H01S5/042;H01S5/22;H01S5/227;H01S5/32 主分类号 H01L27/15
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