| 摘要 |
A method of forming successive metal layers of varying widths on a substrate is disclosed. A mask (14) having a through aperture (15) is provided, the mask including a constricted neck portion (17) between its upper and lower surfaces. Successive metal layers (20, 22, 23) are applied over the substrate through the aperture in the mask sequentially by sputtering methods, which form metallic layers (20) (23) wider than the constricted neck portion of the mask, and by vapor deposition methods which form a narrower metal layer (22) corresponding to the transverse dimension of the constricted portion of the mask. <IMAGE> |
