发明名称 PHOTOSENSITIVE COMPOSITION
摘要 : A photosensitive composition comprises: (a) a photosensitive diazo resin represented by the general formula (I): (I) wherein R1, R2 and R3 each represents a hydrogen atom, an alkyl or alkoxy group, R represents a hydrogen atom, an alkyl or phenyl group, X represents PF6 or BF4 and n represents a number of 1 to 200, in which resins of the above formula in which n is at least 5 are present in an amount of more than 20 mol %, (b) an oleophilic high molecular compound containing a hydroxyl group and (c) a high molecular organic acid without hydroxyl group, and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition.
申请公布号 CA1264022(A) 申请公布日期 1989.12.27
申请号 CA19850492785 申请日期 1985.10.11
申请人 MITSUBISHI CHEMICAL INDUSTRIES LIMITED;KONISHIROKU PHOTO INDUSTRY CO., LTD. 发明人 TOMIYASU, HIROSHI;MAEDA, YOSHIHIRO;GOTO, KIYOSHI;SUZUKI, NORIHITO
分类号 G03F7/016;G03C1/52;G03C1/54;G03C1/60;G03F7/004;G03F7/021;G03F7/033;G03F7/038 主分类号 G03F7/016
代理机构 代理人
主权项
地址