摘要 |
A process for disproportionating silanes, which comprises contacting a silane having at least one Si-H bond represented by the general formula RlHmSiX4-(l+m) wherein R represents an alkyl or aryl group, X represents a halogen atom or an alkoxy group, l is 0, 1 or 2, and m is 1, 2 or 3 and l+m is 1, 2 or 3, and when l is 2, R's may be identical or different, and when l+m is 1 or 2, X's may be identical or different, with a reaction product of a strong acid-type cation exchange resin with an amine and disproportionating the silane. |
申请人 |
MITSUI TOATSU CHEMICALS INC. |
发明人 |
INOUE, KAORU;MIYAGAWA, HIROHARU;ITOH, MASAYOSHI;ABE, TOMOHIRO;KOIZUMI, KYOGO;YANAGAWA, NORIYUKI |