发明名称 Solutions of permonosulphuric acid.
摘要 <p>Aqueous mixed permonosulphuric acid/sulphuric acid solutions, such as semiconductor surface photoresist stripping solutions may be stabilised for storage by the addition of one or more of the metals gallium, germanium, indium, tin in the 4-valent form, antimony, thallium, bismuth and lead suitably in the oxide or hydrous oxide form. Mixtures of metals, for example of bismuth, tin in the 4-valent form, gallium and germanium may be particularly effective.</p>
申请公布号 EP0346667(A1) 申请公布日期 1989.12.20
申请号 EP19890109587 申请日期 1989.05.27
申请人 MICRO-IMAGE TECHNOLOGY LIMITED 发明人 LAPHAM, DAVID JOHN;TROUGHTON, NICHOLAS ARADOR
分类号 C01B15/08;G03F7/42 主分类号 C01B15/08
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