发明名称 INSPECTING METHOD FOR PATTERN DEFECT
摘要 PURPOSE:To detect the pattern defect in a short time by vibrating a pattern surface to be inspected and observing it by an image sensor. CONSTITUTION:The pattern 11 to be inspected is in a mutually parallel and has periodically repeated line and space pattern shape. Here, the pattern 11 is vibrated in operation cycles matching with pattern cycles 13 at right angles to line patterns 12 as shown by an arrow and a two-dimensional image sensor 21 makes an observation for a time longer than the vibration cycles. At this time, a detected image 31 shows a detection image of the patterns 12 as the integral quantity of the observation time and its vibration amplitude is equal to the pattern cycles 13, so the patterns 12 are represented as a monotone image apparently. Therefore, a pattern defect 11a projecting from the patterns 12 is detected clearly as a defect image 31a which is independently conspicuous in the monotone image plane.
申请公布号 JPH01311257(A) 申请公布日期 1989.12.15
申请号 JP19880142255 申请日期 1988.06.09
申请人 MITSUBISHI ELECTRIC CORP 发明人 YOSHIOKA NOBUYUKI;TAKEUCHI SUSUMU
分类号 G01B11/24;G01N21/88;G01N21/956;H01L21/66 主分类号 G01B11/24
代理机构 代理人
主权项
地址