| 摘要 |
<p>A holding fixture for plasma enhanced chemical vapor deposition processing of semiconductor wafers comprising a frameboat assembly for holding disc-shape, semiconductor wafer workpieces (10) to be subjected to a flow of reactant gases. The boat comprises a pair of upright, spaced-apart insulating frame end members (1, 1') having rods (2, 2') secured between the members for holding the boat in assembled relation. An electrode supporting cradle is secured within the boat for holding a plurality of flat, spaced-apart electrodes (3) in an upright position. A workpiece holding rack comprised by at least two spaced-apart, parallel, insulating, workpiece support, enlongated rods (9, 9') is provided with each rod being seated in longitudinally aligned apertures formed on lower opposite sides of the periphery of the array of electrodes for holding the workpieces flat against the opposite surfaces of the respective electrodes. The fixture is completed by power rods (6, 6') applying an electric potential difference between alternate ones of the electrodes.</p> |
