发明名称 CLEANING LIQUID AND CLEANING METHOD FOR AUTOMATIC DEVELOPING MACHINE FOR ENGRAVING OF PLANOGRAPHIC PRINTING PLATE
摘要 PURPOSE:To facilitate the cleaning of an automatic developing machine by incorporating a fluorine compd. selected from hydrofluoric acid or hydrofluoride into the cleaning liquid. CONSTITUTION:At least one kind of the fluorine compd. selected from the hydrofluoric acid or hydrofluoride is incorporated at 0.005-5wt.% into the clean ing liquid for cleaning the automatic developing machine for engraving of planographic printing plates and the members thereof. The sufficient cleaning effect is not obtainable if the concn. of the fluorine compd. is below said range and the cleaning effect is satd. and there is a need for taking care for the toxicity thereof into consideration at the concn. higher than said range. Further, an org. acid is preferably incorporated into this detergent in order to maintain the pH at acidity and to intensify the detergency thereof. The cleaning of the automatic developing machine is thereby facilitated and the corrosion of the members by the cleaning liquid is suppressed to a lower level.
申请公布号 JPH01310356(A) 申请公布日期 1989.12.14
申请号 JP19880142393 申请日期 1988.06.09
申请人 FUJI PHOTO FILM CO LTD 发明人 TOYAMA TADAO;KUNICHIKA KENJI;OBA HISAO
分类号 B41N3/00;C11D7/04;G03F7/26;G03F7/30 主分类号 B41N3/00
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