| 摘要 |
<p>A device for vacuum deposition of films comprises an evaporating chamber (1) filled with the material (10) to be deposited and embraced by a heating element (2). The chamber (1) is connected to an identical collimator chamber (3), each of them being provided with two openings (4, 5) located on the same horizontal axis (8), one of the openings housing a sleeve (6, 7), so that the sleeve (6) of the evaporating chamber (1) is located in the opening (5) of the collimator chamber (3), whereas the evaporating chamber (1) itself is provided with a sealing element (9) mounted in another opening (4) of said chamber (1).</p> |
